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Dow Chemical Deep Ultraviolet Photolithography Semiconductor Fab
Project Information
- Project Location:
- Marlborough, MA
- Status:
- Completed
- Structure Type:
- Laboratory
References
- Architect:
- Woodbrier Associates
Scope Of Work
JM Coull completed the design and construction of the FAB 3-DUV, ISO 3 cleanroom for Dow's Marlborough campus. The company is a global supplier of enabling materials found in consumer electronics, flat-panel displays, and telecommunications.
Project Features
12,000 sf total
ISO 3 cleanroom
Temperature 68° ± 1/2° F and humidity 45% ± 1% RH
Strict limitations on vibration, molecular outgassing, sound levels, and room pressurization
Project Images
